ALD-tuned titanium dioxide nanophotonics

Markus Häyrinen; Arijit Bera; Matthieu Roussey; Markku Kuittinen; Seppo Honkanen

doi:10.1117/12.2178132

1 June 2015 ALD-tuned titanium dioxide nanophotonics

Markus Häyrinen, Arijit Bera, Matthieu Roussey, Markku Kuittinen, Seppo Honkanen

Proceedings Volume 9519, Nanotechnology VII; 951903 (2015) https://doi.org/10.1117/12.2178132
Event: SPIE Microtechnologies, 2015, Barcelona, Spain

Abstract

We demonstrate the possibilities of atomic layer deposition technology to fabricate and improve the quality of nanowaveguide devices of a different kind in TiO₂ platform. In particular, we present an original re-coating method of improving the quality of amorphous TiO₂ strip waveguides, which reduces the propagation losses significantly. Then we demonstrate how atomic layer deposition technology makes it possible to fabricate very precise slot waveguides and to tune the geometrical parameters of nanobeam cavities operating with visible light. The main fabrication methods of the presented structures are electron beam lithography, reactive ion etching and atomic layer deposition.

Citation Download Citation

Markus Häyrinen, Arijit Bera, Matthieu Roussey, Markku Kuittinen, and Seppo Honkanen "ALD-tuned titanium dioxide nanophotonics", Proc. SPIE 9519, Nanotechnology VII, 951903 (1 June 2015); https://doi.org/10.1117/12.2178132

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