Paper
6 March 2015 Multiple-grating self-correcting algorithm for processed mark measurement error
Author Affiliations +
Proceedings Volume 9446, Ninth International Symposium on Precision Engineering Measurement and Instrumentation; 94462M (2015) https://doi.org/10.1117/12.2181178
Event: International Symposium on Precision Engineering Measurement and Instrumentation, 2014, Changsha/Zhangjiajie, China
Abstract
When substrate is processed, also any measurement grating marks available on the substrate will be influenced: they will be deformed asymmetrically, which gives rise to a measurement-shift error when measuring such a grating mark. To measure on a processed mark, an algorithm is used. This algorithm describes a method to calculate the weight factor of the information from each order. The weight factors of such an algorithm are based on a model which describes the measurement position as a function of the diffraction orders and the mark position. This paper proposes an algorithm for finding these weight factors, and the feasibility of the method is validated through simulation.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tao Zhang, Jiubin Tan, and Jiwen Cui "Multiple-grating self-correcting algorithm for processed mark measurement error", Proc. SPIE 9446, Ninth International Symposium on Precision Engineering Measurement and Instrumentation, 94462M (6 March 2015); https://doi.org/10.1117/12.2181178
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Optimization (mathematics)

Diffraction

Diffraction gratings

Error analysis

Chemical mechanical planarization

Computer simulations

Mathematical modeling

Back to Top