New robust and highly customizable light source management system

Yuji Minegishi; Kenji Takahisa; Hideyuki Ochiai; Takeshi Ohta; Tatsuo Enami

doi:10.1117/12.2180273

18 March 2015 New robust and highly customizable light source management system

Yuji Minegishi, Kenji Takahisa, Hideyuki Ochiai, Takeshi Ohta, Tatsuo Enami

Proceedings Volume 9426, Optical Microlithography XXVIII; 942627 (2015) https://doi.org/10.1117/12.2180273
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

In semiconductor lithography, light sources play a significant role in the wafer production process as well as impacting the manufacturing cost per wafer. Chip manufacturers going forward will be challenged to develop new ways to become more cost effective than their competitors, and the software tools necessary to compete in this environment must be capable of effectively adapting to the unique needs of each manufacturer. Gigaphoton has developed a new highly customizable software system for managing light sources. It not only offers a simple and intuitive user interface that can be operated using a standard web browser on PCs, tablets, and smartphones, but also a platform for users and third parties to develop unique extensions and optimizations.

Citation Download Citation

Yuji Minegishi, Kenji Takahisa, Hideyuki Ochiai, Takeshi Ohta, and Tatsuo Enami "New robust and highly customizable light source management system", Proc. SPIE 9426, Optical Microlithography XXVIII, 942627 (18 March 2015); https://doi.org/10.1117/12.2180273

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