Nanoimprint lithography for green water-repellent film derived from biomass with high-light transparency

Satoshi Takei; Makoto Hanabata

doi:10.1117/12.2081820

20 March 2015 Nanoimprint lithography for green water-repellent film derived from biomass with high-light transparency

Satoshi Takei, Makoto Hanabata

Proceedings Volume 9425, Advances in Patterning Materials and Processes XXXII; 94251V (2015) https://doi.org/10.1117/12.2081820
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

Newly eco-friendly high light transparency film with plant-based materials was investigated to future development of liquid crystal displays and optical devices with water repellency as a chemical design concept of nanoimprint lithography. This procedure is proven to be suitable for material design and the process conditions of ultraviolet curing nanoimprint lithography for green water-repellent film derived from biomass with high-light transparency. The developed formulation of advanced nanoimprinted materials design derived from lactulose and psicose, and the development of suitable UV nanoimprint conditions produced high resolutions of the conical shaped moth-eye regularly-nanostructure less than approximately 200 nm diameter, and acceptable patterning dimensional accuracy by the replication of 100 times of UV nanoimprint lithography cycles. The newly plant-based materials and the process conditions are expected as one of the defect less nanoimprint lithographic technologies in next generation electronic devices.

Citation Download Citation

Satoshi Takei and Makoto Hanabata "Nanoimprint lithography for green water-repellent film derived from biomass with high-light transparency", Proc. SPIE 9425, Advances in Patterning Materials and Processes XXXII, 94251V (20 March 2015); https://doi.org/10.1117/12.2081820

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