Paper
19 March 2015 Electric-field assisted assembly of core-shell nanoparticle arrays for contact hole patterning
Lan Lin, Xuexue Guo, Theresa S. Mayer
Author Affiliations +
Abstract
In this paper, we investigate an electric-field assisted assembly approach to create dense arrays of contact hole patterns with complex feature geometries. This hybrid strategy uses a spatially varying dielectrophoretic (DEP) force created by lithographically defined guiding features to assemble dense arrays of nanoparticles within the features, thereby replicating features within the starting pattern. For close-packed particle arrays, the half- and full-pitch of the contact hole array is defined by the starting nanoparticle core and shell diameter.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Lan Lin, Xuexue Guo, and Theresa S. Mayer "Electric-field assisted assembly of core-shell nanoparticle arrays for contact hole patterning", Proc. SPIE 9423, Alternative Lithographic Technologies VII, 94231U (19 March 2015); https://doi.org/10.1117/12.2087547
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Cited by 1 scholarly publication.
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KEYWORDS
Particles

Nanoparticles

Dielectrophoresis

Nanolithography

Lithography

Curium

Electron beam lithography

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