Fabrication of broadband antireflection coating at terahertz frequency using a hot emboss method

YunZhou Li; Bin Cai; YiMing Zhu

doi:10.1117/12.2073965

11 November 2014 Fabrication of broadband antireflection coating at terahertz frequency using a hot emboss method

YunZhou Li, Bin Cai, YiMing Zhu

Proceedings Volume 9275, Infrared, Millimeter-Wave, and Terahertz Technologies III; 92750K (2014) https://doi.org/10.1117/12.2073965
Event: SPIE/COS Photonics Asia, 2014, Beijing, China

Abstract

We fabricated a terahertz anti-reflective structure on a polystylene by using a hot-embossing method. Polystylene was spin-coated onto a silicon substrate and then transformed by using a metallic mould comprising a bunch of Chinese acupuncture needles. The transformation layer yielded gradient refractive index profiles on the substrate which can reduce the surface reflection effectively. The samples were evaluated by a terahertz time-domain spectroscope. Compared with a bare silicon substrate, we observed an increase of ~30% in the transmittance. We also observed broader bandwidth properties compared with a single-layer antireflective structure. The process imposes no substrate limiting; i.e., it has great potential to be applied onto various THz devices.

Citation Download Citation

YunZhou Li, Bin Cai, and YiMing Zhu "Fabrication of broadband antireflection coating at terahertz frequency using a hot emboss method", Proc. SPIE 9275, Infrared, Millimeter-Wave, and Terahertz Technologies III, 92750K (11 November 2014); https://doi.org/10.1117/12.2073965

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