Paper
5 September 2014 A reflectometer for at-wavelength characterization of XUV-reflection gratings
F. Eggenstein, P. Bischoff, A. Gaupp, F. Senf, A. Sokolov, T. Zeschke, F. Schäfers
Author Affiliations +
Abstract
Within our technology center for production of highly efficient precision gratings a versatile 4-circle UHV-reflectometer for synchrotron radiation based at-wavelength characterization has been fabricated. The main feature is the possibility to incorporate real live-sized gratings. The samples are adjustable within six degrees of freedom by a novel UHV-tripod system, and the reflectivity can be measured at all incidence angles for both s- and p-polarization geometry. The reflectometer has been setup in a clean room hutch and it is coupled permanently to the optics beamline PM-1 for the UV and XUV range with the polarization adjustable to either linear or elliptical. The setup will be open to users by the end of 2014.
© (2014) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
F. Eggenstein, P. Bischoff, A. Gaupp, F. Senf, A. Sokolov, T. Zeschke, and F. Schäfers "A reflectometer for at-wavelength characterization of XUV-reflection gratings", Proc. SPIE 9206, Advances in Metrology for X-Ray and EUV Optics V, 920607 (5 September 2014); https://doi.org/10.1117/12.2061828
Lens.org Logo
CITATIONS
Cited by 6 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Reflectometry

Mirrors

Sensors

Polarization

Extreme ultraviolet

Monochromators

LabVIEW

RELATED CONTENT

An XUV optics beamline at BESSY II
Proceedings of SPIE (September 05 2014)
Status of EUV reflectometry at PTB
Proceedings of SPIE (April 01 2013)
Extension of PTB's EUV metrology facilities
Proceedings of SPIE (March 23 2012)

Back to Top