Development of new xanthendiol derivatives applied to the negative-tone molecular resists for EB/EUVL

Takashi Sato; Masako Yamakawa; Yumi Ochiai; Yu Okada; Takashi Makinoshima; Masaaki Takasuka; Masatoshi Echigo

doi:10.1117/12.2045654

27 March 2014 Development of new xanthendiol derivatives applied to the negative-tone molecular resists for EB/EUVL

Takashi Sato, Masako Yamakawa, Yumi Ochiai, Yu Okada, Takashi Makinoshima, Masaaki Takasuka, Masatoshi Echigo

Proceedings Volume 9051, Advances in Patterning Materials and Processes XXXI; 905121 (2014) https://doi.org/10.1117/12.2045654
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

In our previous paper, we reported the development of new xanthendiol derivatives applied to the negative-tone molecular resists for EB/EUVL. We also reported the EB patterning result showed the resist containing the new xanthendiol, 13-biphenyl-13H-benzoxanthen-3,10-diol, could resolve the 30 nm half-pitch pattern. In this paper, we report the resist containing the new xanthendiol could resolve the 20 nm half-pitch pattern without pattern collapse by optimizing formulation and conditions. Furthermore 15 nm half-pitch patterns were partially resolved. And the EUVL patterning result also shows 20 nm half-pitch pattern.

Citation Download Citation

Takashi Sato, Masako Yamakawa, Yumi Ochiai, Yu Okada, Takashi Makinoshima, Masaaki Takasuka, and Masatoshi Echigo "Development of new xanthendiol derivatives applied to the negative-tone molecular resists for EB/EUVL", Proc. SPIE 9051, Advances in Patterning Materials and Processes XXXI, 905121 (27 March 2014); https://doi.org/10.1117/12.2045654

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