Deprotonation mechanism of ionized poly(4-hydroxystyrene)

Toshihiko Susa; Kazumasa Okamoto; Takuya Ishida; Hiroki Yamamoto; Takahiro Kozawa; Ryoko Fujiyoshi; Kikuo Umegaki

doi:10.1117/12.2045881

27 March 2014 Deprotonation mechanism of ionized poly(4-hydroxystyrene)

Toshihiko Susa, Kazumasa Okamoto, Takuya Ishida, Hiroki Yamamoto, Takahiro Kozawa, Ryoko Fujiyoshi, Kikuo Umegaki

Proceedings Volume 9051, Advances in Patterning Materials and Processes XXXI; 90511O (2014) https://doi.org/10.1117/12.2045881
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

Poly(4-hydroxystyrene) (PHS), a backbone polymer in resist constituents is also a promising material for extreme ultraviolet (EUV) and electron beam (EB) lithography. Efficient deprotonation occurs from radical cations of irradiated PHS. A hydroxystyrene unit is incorporated in the chemically amplified resist structure as a proton source, in which reaction mechanism has not been well established. In this study, deprotonation mechanism of an ionized PHS was characterized by using pulse radiolysis techniques. The influence of several additives such as sulfoxides and amides with high acidity on the kinetics of the deprotonation was investigated to clarify the fundamentals of the enhancement of deprotonation efficiency from the PHS radical cation. Influence of the additives on the acid yield in thin film was also investigated.

Citation Download Citation

Toshihiko Susa, Kazumasa Okamoto, Takuya Ishida, Hiroki Yamamoto, Takahiro Kozawa, Ryoko Fujiyoshi, and Kikuo Umegaki "Deprotonation mechanism of ionized poly(4-hydroxystyrene)", Proc. SPIE 9051, Advances in Patterning Materials and Processes XXXI, 90511O (27 March 2014); https://doi.org/10.1117/12.2045881

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