Innovative solutions on 193 immersion-based self-aligned multiple patterning

Sakurako Natori; Shohei Yamauchi; Arisa Hara; Masatoshi Yamato; Kenichi Oyama; Hidetami Yaegashi

doi:10.1117/12.2046220

27 March 2014 Innovative solutions on 193 immersion-based self-aligned multiple patterning

Sakurako Natori, Shohei Yamauchi, Arisa Hara, Masatoshi Yamato, Kenichi Oyama, Hidetami Yaegashi

Proceedings Volume 9051, Advances in Patterning Materials and Processes XXXI; 90511E (2014) https://doi.org/10.1117/12.2046220
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

EUV lithography is one of the most promising techniques for sub-20nm half-pitch HVM devices, however it is well known that EUVL solutions still face significant challenges. Therefore we have focused on 193 immersion extension by using a self-aligned multiple patterning (SAMP), and this technique easily enables fine periodical patterning. Spacer patterning techniques have already been applied to sub-20nm hp advanced devices. In general, SAMP consists of SADP, SATP, SAQP, etc. We have already introduced about evolutional schemes and cost effective processes in past SPIE sessions.[1-12] SAQP enable further down-scaling to 10nm hp from SADP levels, however we must consider next advanced solution for sub-10nm hp resolution. In this paper, we will discuss about a possibility of 193 immersion extension using SAOP (self-aligned octuple patterning).

Citation Download Citation

Sakurako Natori, Shohei Yamauchi, Arisa Hara, Masatoshi Yamato, Kenichi Oyama, and Hidetami Yaegashi "Innovative solutions on 193 immersion-based self-aligned multiple patterning", Proc. SPIE 9051, Advances in Patterning Materials and Processes XXXI, 90511E (27 March 2014); https://doi.org/10.1117/12.2046220

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