AIS wavefront sensor: a robust optical test of exposure tools using localized wavefront curvature

Ryan Miyakawa; Xibin Zhou; Michael Goldstein; Dominic Ashworth; Kevin Cummings; Yu-Jen Fan; Yashesh Shroff; Greg Denbeaux; Yudhi Kandel; Patrick Naulleau

doi:10.1117/12.2048389

17 April 2014 AIS wavefront sensor: a robust optical test of exposure tools using localized wavefront curvature

Ryan Miyakawa, Xibin Zhou, Michael Goldstein, Dominic Ashworth, Kevin Cummings, Yu-Jen Fan, Yashesh Shroff, Greg Denbeaux, Yudhi Kandel, Patrick Naulleau

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Proceedings Volume 9048, Extreme Ultraviolet (EUV) Lithography V; 90483A (2014) https://doi.org/10.1117/12.2048389
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

We present an update of the AIS wavefront sensor, a diagnostic sensor set for insertion in the upgraded 0.5 NA SEMATECH Albany and Berkeley METs. AIS works by using offset monopole illumination to probe localized regions of the test optic pupil. Variations in curvature manifest as focus shifts, which are measured using a photodiode- based grating-on- grating contrast monitor, and the wavefront aberrations are reconstructed using a least-squares approach. We present results from an optical prototype of AIS demonstrating an accuracy of better than λ/30 rms for Zernike polynomials Z₄ through Z₁₀. We also discuss integration strategies and requirements as well as specifications on system alignment.

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Ryan Miyakawa, Xibin Zhou, Michael Goldstein, Dominic Ashworth, Kevin Cummings, Yu-Jen Fan, Yashesh Shroff, Greg Denbeaux, Yudhi Kandel, and Patrick Naulleau "AIS wavefront sensor: a robust optical test of exposure tools using localized wavefront curvature", Proc. SPIE 9048, Extreme Ultraviolet (EUV) Lithography V, 90483A (17 April 2014); https://doi.org/10.1117/12.2048389

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