LPP EUV source readiness for NXE 3300B

David C. Brandt; Igor V. Fomenkov; Nigel R. Farrar; Bruno La Fontaine; David W. Myers; Daniel J. Brown; Alex I. Ershov; Norbert R. Böwering; Daniel J. Riggs; Robert J. Rafac; Silvia De Dea; Rudy Peeters; Hans Meiling; Noreen Harned; Daniel Smith; Alberto Pirati; Robert Kazinczi

doi:10.1117/12.2048184

18 March 2014 LPP EUV source readiness for NXE 3300B

David C. Brandt, Igor V. Fomenkov, Nigel R. Farrar, Bruno La Fontaine, David W. Myers, Daniel J. Brown, Alex I. Ershov, Norbert R. Böwering, Daniel J. Riggs, Robert J. Rafac, Silvia De Dea, Rudy Peeters, Hans Meiling, Noreen Harned, Daniel Smith, Alberto Pirati, Robert Kazinczi

Author Affiliations +

Proceedings Volume 9048, Extreme Ultraviolet (EUV) Lithography V; 90480C (2014) https://doi.org/10.1117/12.2048184
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

Laser produced plasma (LPP) light sources have been developed as the primary approach for EUV scanner imaging of circuit features in sub-20nm devices in high volume manufacturing (HVM). This paper provides a review of development progress and readiness status for the LPP extreme-ultra-violet (EUV) source. We present the latest performance results from second generation sources, including Prepulse operation for high power, collector protection for long lifetime and low cost of ownership, and dose stability for high yield. Increased EUV power is provided by a more powerful drive laser and the use of Prepulse operation for higher conversion efficiciency. Advanced automation and controls have been developed to provide the power and energy stability performance required during production fab operation. We will also discuss lifetesting of the collector in Prepulse mode and show the ability of the debris mitigation systems to keep the collector multi-layer coating free from damage and maintain high reflectivity.

Citation Download Citation

David C. Brandt, Igor V. Fomenkov, Nigel R. Farrar, Bruno La Fontaine, David W. Myers, Daniel J. Brown, Alex I. Ershov, Norbert R. Böwering, Daniel J. Riggs, Robert J. Rafac, Silvia De Dea, Rudy Peeters, Hans Meiling, Noreen Harned, Daniel Smith, Alberto Pirati, and Robert Kazinczi "LPP EUV source readiness for NXE 3300B", Proc. SPIE 9048, Extreme Ultraviolet (EUV) Lithography V, 90480C (18 March 2014); https://doi.org/10.1117/12.2048184

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