Paper
25 July 2013 Resistive shorts characterization in CMOS standard cells for test pattern generation
Andrzej Wielgus, Bartosz Potrykus
Author Affiliations +
Proceedings Volume 8902, Electron Technology Conference 2013; 89020W (2013) https://doi.org/10.1117/12.2031300
Event: Electron Technology Conference 2013, 2013, Ryn, Poland
Abstract
This paper presents an extended method of CMOS standard cells characterization for defect based voltage testing. Resistance of a short defect is taken into account while considering faulty behavior caused by this defect and finding the test vectors that detect this fault. Finally, all of found vectors are validated to check their effectiveness in fault covering and the optimal test sequence for all detectable faults is constructed. Experimental results for cells from industrial standard cell library are presented.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Andrzej Wielgus and Bartosz Potrykus "Resistive shorts characterization in CMOS standard cells for test pattern generation", Proc. SPIE 8902, Electron Technology Conference 2013, 89020W (25 July 2013); https://doi.org/10.1117/12.2031300
Lens.org Logo
CITATIONS
Cited by 1 scholarly publication.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Resistance

Logic

Device simulation

Standards development

Integrated circuits

CMOS technology

Digital electronics

Back to Top