Fabrication of x-ray gratings by direct write maskless lithography

D. L. Voronov; S. Diez; P. Lum; S. A. Hidalgo; T. Warwick; N. Artemiev; H. A. Padmore

doi:10.1117/12.2024489

27 September 2013 Fabrication of x-ray gratings by direct write maskless lithography

D. L. Voronov, S. Diez, P. Lum, S. A. Hidalgo, T. Warwick, N. Artemiev, H. A. Padmore

Proceedings Volume 8848, Advances in X-Ray/EUV Optics and Components VIII; 88480Q (2013) https://doi.org/10.1117/12.2024489
Event: SPIE Optical Engineering + Applications, 2013, San Diego, California, United States

Abstract

Fabrication of diffraction grating for x-rays is a very challenging problem due to the exacting requirements of surface quality, groove position, and groove profile. Traditional fabrication techniques have significant limitations and do not cover all the necessary requirements. For example, classical holographic recording is limited in the type of groove patterns that can be produced. This is particularly important in the design of wide aperture high resolution spectrometers, where aberration correction using complex groove patterns is necessary. We are pioneering the use of direct-write mask-less optical lithography to make grating patterns of arbitrary complexity. In this work we report on the first results from our direct-write mask-less approach, including quality assessment of the patterns using interferometric techniques.

Citation Download Citation

D. L. Voronov, S. Diez, P. Lum, S. A. Hidalgo, T. Warwick, N. Artemiev, and H. A. Padmore "Fabrication of x-ray gratings by direct write maskless lithography", Proc. SPIE 8848, Advances in X-Ray/EUV Optics and Components VIII, 88480Q (27 September 2013); https://doi.org/10.1117/12.2024489

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