Wide band antireflection coatings deposited by atomic layer deposition

April D. Jewell; John Hennessy; Michael E. Hoenk; Shouleh Nikzad

doi:10.1117/12.2025198

25 September 2013 Wide band antireflection coatings deposited by atomic layer deposition

April D. Jewell, John Hennessy, Michael E. Hoenk, Shouleh Nikzad

Proceedings Volume 8820, Nanoepitaxy: Materials and Devices V; 88200Z (2013) https://doi.org/10.1117/12.2025198
Event: SPIE NanoScience + Engineering, 2013, San Diego, California, United States

Abstract

Here we describe the development of optical coatings for silicon-based detectors for astronomy, planetary and terrestrial applications. We have used atomic layer deposition (ALD) to develop broadband (i.e. 320-1000 nm) antireflection (AR) coatings on silicon substrates with the ultimate goal of incorporating these AR coatings with existing detector technologies. Materials characterization was used to study film and interface quality of these coatings. We are able to achieve precision growth of single and multilayer films to significantly reduce reflection losses for this region of spectrum and provide tailored, repeatable performance targeted for specific applications.

Citation Download Citation

April D. Jewell, John Hennessy, Michael E. Hoenk, and Shouleh Nikzad "Wide band antireflection coatings deposited by atomic layer deposition", Proc. SPIE 8820, Nanoepitaxy: Materials and Devices V, 88200Z (25 September 2013); https://doi.org/10.1117/12.2025198

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