PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
Acoustic energy applied through the cleaning media results into two kinds of cavitation effects; namely stable and
transient cavitation. A uniformly pulsating bubble transforms into stable cavitation behavior whereas a bubble implosion
implies transient cavitation. Pattern damage of sensitive features on advanced masks as well as Ru pitting on EUVL
reticles is mostly the result of transient cavitation. Stable cavitation on the other hand produces a very narrowly
controlled energy distribution which allows cleaning without damage. Stable cavitation can be achieved by suitably
tailoring physical, chemical and thermodynamic properties of the liquid and gas media.
In this paper we investigate a new cleaning chemistry that has favorable physical and thermodynamic properties to
produce stable MegaSonic cavitation. The cavitation created in this chemistry is characterized by measuring acoustic
energy as well as by pattern damage and particle removal efficiency on mask level. The chemical properties (pH and zeta
potential) of this chemistry are compared with conventional cleaning chemistries. Its effects on CD shift as well as phase
and transmission loss are also studied.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
The alert did not successfully save. Please try again later.
Sherjang Singh, Uwe Dietze, Peter Dress, "Effect of cleaning chemistry on MegaSonic damage," Proc. SPIE 8701, Photomask and Next-Generation Lithography Mask Technology XX, 870104 (28 June 2013); https://doi.org/10.1117/12.2027974