Pattern matching for identifying and resolving non-decomposition-friendly designs for double patterning technology (DPT)

Lynn T. -N. Wang; Vito Dai; Luigi Capodieci

doi:10.1117/12.2011690

29 March 2013 Pattern matching for identifying and resolving non-decomposition-friendly designs for double patterning technology (DPT)

Lynn T. -N. Wang, Vito Dai, Luigi Capodieci

Author Affiliations +

Proceedings Volume 8684, Design for Manufacturability through Design-Process Integration VII; 868409 (2013) https://doi.org/10.1117/12.2011690
Event: SPIE Advanced Lithography, 2013, San Jose, California, United States

Abstract

A pattern matching methodology that identifies non-decomposition-friendly designs and provides localized guidance for layout-fixing is presented for double patterning lithography. This methodology uses a library of patterns in which each pattern has been pre-characterized as impossible-to-decompose and annotated with a design rule for guiding the layout fixes. A pattern matching engine identifies these problematic patterns in design, which allows the layout designers to anticipate and prevent decomposition errors, prior to layout decomposition. The methodology has been demonstrated on a 180 um² layout migrated from the previous 28nm technology node for the metal 1 layer. Using a small library of just 18 patterns, the pattern matching engine identified 119 out of 400 decomposition errors, which constituted coverage of 29.8%.

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Lynn T. -N. Wang, Vito Dai, and Luigi Capodieci "Pattern matching for identifying and resolving non-decomposition-friendly designs for double patterning technology (DPT)", Proc. SPIE 8684, Design for Manufacturability through Design-Process Integration VII, 868409 (29 March 2013); https://doi.org/10.1117/12.2011690

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