High-productivity immersion scanner enabling 1xnm hp manufacturing

Yosuke Shirata; Yuichi Shibazaki; Junichi Kosugi; Takahisa Kikuchi; Yasuhiro Ohmura

doi:10.1117/12.2011123

12 April 2013 High-productivity immersion scanner enabling 1xnm hp manufacturing

Yosuke Shirata, Yuichi Shibazaki, Junichi Kosugi, Takahisa Kikuchi, Yasuhiro Ohmura

Proceedings Volume 8683, Optical Microlithography XXVI; 86831K (2013) https://doi.org/10.1117/12.2011123
Event: SPIE Advanced Lithography, 2013, San Jose, California, United States

Abstract

NSR-S622D, Nikon’s new ArF immersion scanner, provides the best and practicable solutions to meet the escalating requirement from device manufactures to accommodate the further miniaturization of device pattern. NSR-S622D has various additional functions compared to the previous model such as the newly developed illumination system, new projection lens, new AF system new wafer table in addition to the matured Streamlign platform. These new features will derive the outstanding performance of NSR, enabling highly controlled CD uniformity, focus accuracy and overlay accuracy. NSR-S622D will provide the adequate capabilities that are demanded from a lithography tool for production of 1x nm hp node and beyond.

Citation Download Citation

Yosuke Shirata, Yuichi Shibazaki, Junichi Kosugi, Takahisa Kikuchi, and Yasuhiro Ohmura "High-productivity immersion scanner enabling 1xnm hp manufacturing", Proc. SPIE 8683, Optical Microlithography XXVI, 86831K (12 April 2013); https://doi.org/10.1117/12.2011123

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