Effects of varying the parameters in witness-sample-based photoresist outgas testing: dependence of the carbon growth on pumping speed and the dose, time, and area of resist exposure

C. Tarrio; R. F. Berg; S. B. Hill; S. Grantham; N. S. Faradzhev; T. B. Lucatorto

doi:10.1117/12.2011663

1 April 2013 Effects of varying the parameters in witness-sample-based photoresist outgas testing: dependence of the carbon growth on pumping speed and the dose, time, and area of resist exposure

C. Tarrio, R. F. Berg, S. B. Hill, S. Grantham, N. S. Faradzhev, T. B. Lucatorto

Author Affiliations +

Proceedings Volume 8679, Extreme Ultraviolet (EUV) Lithography IV; 867920 (2013) https://doi.org/10.1117/12.2011663
Event: SPIE Advanced Lithography, 2013, San Jose, California, United States

Abstract

In this work, we discuss several parameters influencing extreme ultraviolet (EUV) resist qualification test results. The witness sample resist qualifications test is implemented on several different instruments world wide. The original protocol for the test developed by the tool manufacturer requires that a 300 mm wafer be exposed to a dose to clear in one hour. Also required is that the carbon contamination rate on the witness sample be mass limited, i.e., that the rate be saturated with respect to the EUV or e-beam intensity. Simple arguments have been presented in the past to show that the thickness of the carbon growth should be inversely proportional to the pumping speed and proportional to the area exposed if dose and duration were held constant. The present experiments demonstrate the real-life limitations of these arguments and provide validation to our area scaling procedure to equate test results done with 200 mm wafers to results expected for 300 mm wafers. In the process of studying the dependence of carbon growth on pumping speed, we encountered the important effect of increased partial pressure on the degree of intensity saturation.

Citation Download Citation

C. Tarrio, R. F. Berg, S. B. Hill, S. Grantham, N. S. Faradzhev, and T. B. Lucatorto "Effects of varying the parameters in witness-sample-based photoresist outgas testing: dependence of the carbon growth on pumping speed and the dose, time, and area of resist exposure", Proc. SPIE 8679, Extreme Ultraviolet (EUV) Lithography IV, 867920 (1 April 2013); https://doi.org/10.1117/12.2011663

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available