Paper
30 January 2013 KrF and XeCl laser induced ripples on a polyethersulfone film
H. Pazokian, M. Mollabashi, S. Jelvani, J. Barzin
Author Affiliations +
Proceedings Volume 8677, XIX International Symposium on High-Power Laser Systems and Applications 2012; 86771M (2013) https://doi.org/10.1117/12.2010561
Event: XIX International Symposium on High-Power Laser Systems and Applications, 2012, Istanbul, Turkey
Abstract
In this paper formation of nano- ripples on the surface of a polyethersulfone film upon non polarized KrF laser irradiation at fluences below the ablation threshold and micro ripples upon XeCl laser irradiation are reported. The effect of number of pulses and the repetition rate on the formation, periodicity and orientation of the ripples and the possible mechanisms of the formation are discussed.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
H. Pazokian, M. Mollabashi, S. Jelvani, and J. Barzin "KrF and XeCl laser induced ripples on a polyethersulfone film", Proc. SPIE 8677, XIX International Symposium on High-Power Laser Systems and Applications 2012, 86771M (30 January 2013); https://doi.org/10.1117/12.2010561
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KEYWORDS
Gas lasers

Laser ablation

Photoemission spectroscopy

Laser damage threshold

Laser irradiation

Laser scattering

Light scattering

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