Advanced plasma technology for large scale PECVD processes

J. Landrock; M. Zeuner; M. Nestler; D. Rost

doi:10.1117/12.930427

13 September 2012 Advanced plasma technology for large scale PECVD processes

J. Landrock, M. Zeuner, M. Nestler, D. Rost

Proceedings Volume 8476, Organic Light Emitting Materials and Devices XVI; 847621 (2012) https://doi.org/10.1117/12.930427
Event: SPIE Organic Photonics + Electronics, 2012, San Diego, California, United States

Abstract

MicroSystems is able to provide systems for specialized large area processing based on plasma enhanced chemical vapor deposition (PECVD) and physical vapor deposition (PVD) technologies. The generation of barrier layers has become an important field in a variety of applications. Systems for generating ultra-barrier layers and achieved results are presented and discussed.

Citation Download Citation

J. Landrock, M. Zeuner, M. Nestler, and D. Rost "Advanced plasma technology for large scale PECVD processes", Proc. SPIE 8476, Organic Light Emitting Materials and Devices XVI, 847621 (13 September 2012); https://doi.org/10.1117/12.930427

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