3D silicon micro-pillars/-walls decorated with aluminum-ZnO/ZnO nanowires for opto-electronic device applications

Hakan Karaagac; Logeeswaran V. J.; M. Saif Islam

doi:10.1117/12.945974

19 October 2012 3D silicon micro-pillars/-walls decorated with aluminum-ZnO/ZnO nanowires for opto-electronic device applications

Hakan Karaagac, Logeeswaran V. J., M. Saif Islam

Author Affiliations +

Proceedings Volume 8467, Nanoepitaxy: Materials and Devices IV; 84670Y (2012) https://doi.org/10.1117/12.945974
Event: SPIE NanoScience + Engineering, 2012, San Diego, California, United States

Abstract

In this paper, high aspect ratio vertically oriented p-silicon (100) micropillars and microwalls were fabricated using the deep reactive ion etching (DRIE) process with the BOSCH recipe of cyclical passivation and etching. Two different patterns were etched; uniform pillar arrays of dimensions ~15µm (height) x 2µm (diameter) and wall arrays of dimensions ~1.5µm (width) x 25µm (height). Three-dimensional (3D) heterostructures of n-ZnO/p-Si heterostructures were fabricated from growing hydrothermally dense arrays of ZnO nanowires (290-400 nm in length and 48-80 nm in diameter) and depositing Aluminum-ZnO (AZO) thin film onto the high aspect ratio vertically oriented p-silicon micropillars and microwalls. The performances of the fabricated heterostructure optoelectronic devices were characterized for different applications including solar cells, photodetectors and field ionization gas sensors.

Citation Download Citation

Hakan Karaagac, Logeeswaran V. J., and M. Saif Islam "3D silicon micro-pillars/-walls decorated with aluminum-ZnO/ZnO nanowires for opto-electronic device applications", Proc. SPIE 8467, Nanoepitaxy: Materials and Devices IV, 84670Y (19 October 2012); https://doi.org/10.1117/12.945974

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