Predictable turn-around time for post tape-out flow

Toshikazu Endo; Minyoung Park; Pradiptya Ghosh

doi:10.1117/12.913986

13 March 2012 Predictable turn-around time for post tape-out flow

Toshikazu Endo, Minyoung Park, Pradiptya Ghosh

Proceedings Volume 8326, Optical Microlithography XXV; 83262D (2012) https://doi.org/10.1117/12.913986
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

A typical post-out flow data path at the IC Fabrication has following major components of software based processing - Boolean operations before the application of resolution enhancement techniques (RET) and optical proximity correctin (OPC), the RET and OPC step [etch retargeting, sub-resolution assist feature insertion (SRAF) and OPC], post-OPCRET Boolean operations and sometimes in the same flow simulation based verification. There are two objectives that an IC Fabrication tapeout flow manager wants to achieve with the flow - predictable completion time and fastest turn-around time (TAT). At times they may be competing. There have been studies in the literature modeling the turnaround time from historical data for runs with the same recipe and later using that to derive the resource allocation for subsequent runs. [3]. This approach is more feasible in predominantly simulation dominated tools but for edge operation dominated flow it may not be possible especially if some processing acceleration methods like pattern matching or hierarchical processing is involved. In this paper, we suggest an alternative method of providing target turnaround time and managing the priority of jobs while not doing any upfront resource modeling and resource planning. The methodology then systematically either meets the turnaround time need and potentially lets the user know if it will not as soon as possible. This builds on top of the Calibre Cluster Management (CalCM) resource management work previously published [1][2]. The paper describes the initial demonstration of the concept.

Citation Download Citation

Toshikazu Endo, Minyoung Park, and Pradiptya Ghosh "Predictable turn-around time for post tape-out flow", Proc. SPIE 8326, Optical Microlithography XXV, 83262D (13 March 2012); https://doi.org/10.1117/12.913986

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