Generator of predictive verification pattern using vision system based on higher-order local autocorrelation

Tetsuaki Matsunawa; Shimon Maeda; Hirotaka Ichikawa; Shigeki Nojima; Satoshi Tanaka; Shoji Mimotogi; Hirokazu Nosato; Hidenori Sakanashi; Masahiro Murakawa; Eiichi Takahashi

doi:10.1117/12.916306

13 March 2012 Generator of predictive verification pattern using vision system based on higher-order local autocorrelation

Tetsuaki Matsunawa, Shimon Maeda, Hirotaka Ichikawa, Shigeki Nojima, Satoshi Tanaka, Shoji Mimotogi, Hirokazu Nosato, Hidenori Sakanashi, Masahiro Murakawa, Eiichi Takahashi

Author Affiliations +

Proceedings Volume 8326, Optical Microlithography XXV; 832615 (2012) https://doi.org/10.1117/12.916306
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

Although lithography conditions, such as NA, illumination condition, resolution enhancement technique (RET), and material stack on wafer, have been determined to obtain hotspot-free wafer images, hotspots are still often found on wafers. This is because the lithography conditions are optimized with a limited variety of patterns. For 40 nm technology node and beyond, it becomes a critical issue causing not only the delay of process development but also the opportunity loss of the business. One of the easiest ways to avoid unpredictable hotspots is to verify an enormous variety of patterns in advance. This, however, is time consuming and cost inefficient. This paper proposes a new method to create a group of patterns to cover pattern variations in a chip layout based on Higher-Order Local Autocorrelation (HLAC), which consists of two phases. The first one is the "analyzing phase" and the second is the "generating phase". In the analyzing phase, geometrical features are extracted from actual layouts using the HLAC technique. Those extracted features are statistically analyzed and define the "feature space". In the generating phase, a group of patterns representing actual layout features are generated by correlating the feature space and the process margin. By verifying the proposed generated patterns, the lithography conditions can be optimized efficiently and the number of hotspots dramatically reduced.

Citation Download Citation

Tetsuaki Matsunawa, Shimon Maeda, Hirotaka Ichikawa, Shigeki Nojima, Satoshi Tanaka, Shoji Mimotogi, Hirokazu Nosato, Hidenori Sakanashi, Masahiro Murakawa, and Eiichi Takahashi "Generator of predictive verification pattern using vision system based on higher-order local autocorrelation", Proc. SPIE 8326, Optical Microlithography XXV, 832615 (13 March 2012); https://doi.org/10.1117/12.916306

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available