Overlay quality metric

Guy Cohen; Eran Amit; Dana Klein; Daniel Kandel; Vladimir B. Levinski

doi:10.1117/12.916379

5 April 2012 Overlay quality metric

Guy Cohen, Eran Amit, Dana Klein, Daniel Kandel, Vladimir B. Levinski

Proceedings Volume 8324, Metrology, Inspection, and Process Control for Microlithography XXVI; 832424 (2012) https://doi.org/10.1117/12.916379
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

As overlay budget continues to shrink, an improved analysis of the different contributors to this budget is needed. A major contributor that has never been quantified is the accuracy of the measurements. KLA-Tencor developed a quality metric, that calculates and attaches an accuracy value to each OVL target. This operation is performed on the fly during measurement and can be applied without affecting MAM time or throughput. Using a linearity array we demonstrate that the quality metric identifies targets deviating from the intended OVL value, with no false alarms.

Citation Download Citation

Guy Cohen, Eran Amit, Dana Klein, Daniel Kandel, and Vladimir B. Levinski "Overlay quality metric", Proc. SPIE 8324, Metrology, Inspection, and Process Control for Microlithography XXVI, 832424 (5 April 2012); https://doi.org/10.1117/12.916379

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