Computational study of line tip printability of sub-20-nm technology

Lei Yuan; Thomas Wallow; Deniz Civay; Linus Jang; Jongwook Kye; Harry Levinson; Sohan Singh; Mark Kelling

doi:10.1117/12.915868

23 March 2012 Computational study of line tip printability of sub-20-nm technology

Lei Yuan, Thomas Wallow, Deniz Civay, Linus Jang, Jongwook Kye, Harry Levinson, Sohan Singh, Mark Kelling

Proceedings Volume 8322, Extreme Ultraviolet (EUV) Lithography III; 832229 (2012) https://doi.org/10.1117/12.915868
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

This paper illustrates the increasing importance of line tip printing as measured by the size of the weak line tip zone for sub-20nm technology. This paper suggests adding line tip printability into sub-20nm lithography performance metric in addition to the conventional tip-to-tip resolution. This study shows that these two metrics sometimes respond to lithography conditions inversely. The importance of including line tip printability into technology evaluation is demonstrated by comparing LELE optical lithography and EUV lithography. Also, line tip printing with EUV lithography is explored with various illumination conditions and resist developer tones.

Citation Download Citation

Lei Yuan, Thomas Wallow, Deniz Civay, Linus Jang, Jongwook Kye, Harry Levinson, Sohan Singh, and Mark Kelling "Computational study of line tip printability of sub-20-nm technology", Proc. SPIE 8322, Extreme Ultraviolet (EUV) Lithography III, 832229 (23 March 2012); https://doi.org/10.1117/12.915868

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