Fabrication of the multi-level phase type hologram for display using the laser direct write lithography system

Seiji Nakano; Sumio Nakahara; Shoso Singubara

doi:10.1117/12.909826

9 February 2012 Fabrication of the multi-level phase type hologram for display using the laser direct write lithography system

Seiji Nakano, Sumio Nakahara, Shoso Singubara

Author Affiliations +

Proceedings Volume 8281, Practical Holography XXVI: Materials and Applications; 828116 (2012) https://doi.org/10.1117/12.909826
Event: SPIE OPTO, 2012, San Francisco, California, United States

Abstract

Recently, the demand to the diffractive optical element (DOE) is increasing with the developments in the technology. We created a relative large holographic optical element (HOE) with same course of production of the DOE. To make the person who is situated on the long distance recognize image data using the hologram, the hologram must have bright image reconstruction ability and a high SN ratio. Therefore, we made the multi-level phase type hologram for the former and measured the optical intensity of the reproduction image. For an evaluation method of the diffraction efficiency, we used 2-, 4-, and 8-level phase type Fresnel Zone Plate (FZP). Because it supposed that the amount of object was large, it adopted a computer-generated hologram (CGH). Also, it used laser direct write lithography system that has the feature of high-resolution drawing, high-speed drawing, and a high accuracy positioning system, for the making of hologram.

Citation Download Citation

Seiji Nakano, Sumio Nakahara, and Shoso Singubara "Fabrication of the multi-level phase type hologram for display using the laser direct write lithography system", Proc. SPIE 8281, Practical Holography XXVI: Materials and Applications, 828116 (9 February 2012); https://doi.org/10.1117/12.909826

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