Optical spin orientation in SiGe heterostructures

Giovanni Isella; Federico Bottegoni; Fabio Pezzoli; Stefano Cecchi; Eleonora Gatti; Daniel Chrastina; Emanuele Grilli; Mario Guzzi; Franco Ciccacci

doi:10.1117/12.892749

15 September 2011 Optical spin injection in SiGe heterostructures

Giovanni Isella, Federico Bottegoni, Fabio Pezzoli, Stefano Cecchi, Eleonora Gatti, Daniel Chrastina, Emanuele Grilli, Mario Guzzi, Franco Ciccacci

Author Affiliations +

Proceedings Volume 8100, Spintronics IV; 810007 (2011) https://doi.org/10.1117/12.892749
Event: SPIE NanoScience + Engineering, 2011, San Diego, California, United States

Abstract

We present photoluminescence (PL) and spin polarized photo-emission (SPPE) measurements performed on bulk Ge, and Ge/Si(100) epilayers. A set of bi-axially strained Ge epilayers featuring different strain levels has been deposited by low energy plasma enhanced CVD (LEPECVD) and characterized by high resolution X-ray diffraction (HR-XRD). SPPE data indicate that compressive strain effectively lifts the heavy holes - light holes degeneracy raising the polarization of injected electrons above the P=50% limit of bulk material. Circularly polarized light PL measurements performed on p-type bulk crystals confirm the suitability of Ge for spintronics application showing a robust electron spin inizialization at the direct gap of Ge and giving a lower bound value for the spin relaxation time of ≈ 230 fs.

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Giovanni Isella, Federico Bottegoni, Fabio Pezzoli, Stefano Cecchi, Eleonora Gatti, Daniel Chrastina, Emanuele Grilli, Mario Guzzi, and Franco Ciccacci "Optical spin injection in SiGe heterostructures", Proc. SPIE 8100, Spintronics IV, 810007 (15 September 2011); https://doi.org/10.1117/12.892749

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