Paper
31 May 2011 Polarized optical injection in long-wavelength vertical-cavity surface emitting lasers
A. Hurtado, K. Schires, N. Khan, R. Al-Seyab, I. D. Henning, M. J. Adams
Author Affiliations +
Abstract
We report a comprehensive study of the effects of polarized optical injection in long-wavelength Vertical-Cavity Surface Emitting Lasers (LW-VCSELs) emitting at the telecom wavelength of 1550nm. We analyze the properties of the polarization switching and bistability that can be induced in a 1550nm-VCSEL under orthogonal and arbitrary polarized optical injection. Additionally, we study the injection locking bandwidth of these devices when subject to different polarized optical injection. Furthermore, we also analyze the relationship existing between the injection locking bandwidth and the polarization switching range when the device is subject to orthogonally-polarized optical injection. Finally, we have identified regions of different nonlinear dynamics outside the injection locking bandwidth, including regions of periodic dynamics (such as limit cycle and period doubling) and chaos when these devices are subject to parallel and to orthogonal optical injection. This rich variety of nonlinear effects observed at 1550nm offers exciting prospects for novel practical uses of VCSELs in optical switching/routing applications in optical networks.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
A. Hurtado, K. Schires, N. Khan, R. Al-Seyab, I. D. Henning, and M. J. Adams "Polarized optical injection in long-wavelength vertical-cavity surface emitting lasers", Proc. SPIE 8069, Integrated Photonics: Materials, Devices, and Applications, 806906 (31 May 2011); https://doi.org/10.1117/12.886290
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Vertical cavity surface emitting lasers

Polarization

Picosecond phenomena

Switching

Nonlinear dynamics

Stereolithography

Bistability

Back to Top