Paper
21 October 2011 Polarimetry-based far-field method for high-resolution optical microscopy
Oscar G. Rodríguez-Herrera, David Lara, Chris Dainty
Author Affiliations +
Abstract
We present a polarimetry-based far-field method for high-resolution optical microscopy. The method is based on the measurement of scattering-angle-resolved polarization state distributions across the exit pupil of a high numerical aperture objective lens and allows us to distinguish between different sub-resolution objects with no need for an active scanning. Our numerical and experimental results show that the scattering-angle-resolved polarization state distributions can be used in the characterization of particles and structures with features below or at the edge of the Rayleigh resolution limit.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Oscar G. Rodríguez-Herrera, David Lara, and Chris Dainty "Polarimetry-based far-field method for high-resolution optical microscopy", Proc. SPIE 8011, 22nd Congress of the International Commission for Optics: Light for the Development of the World, 80110V (21 October 2011); https://doi.org/10.1117/12.902119
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Polarization

Objectives

Optical microscopy

Polarimetry

Dielectric polarization

Chromium

Finite-difference time-domain method

RELATED CONTENT

Polarization degradation in a rain-filled medium
Proceedings of SPIE (February 12 1993)
Biaxial ellipsometry
Proceedings of SPIE (August 18 2005)
Optical tweezers 3D photonic force spectroscopy
Proceedings of SPIE (February 09 2006)

Back to Top