Low-speckle holographic beam shaping of high-coherence EUV sources

Christopher N. Anderson; Ryan H. Miyakawa; Patrick P. Naulleau

doi:10.1117/12.881553

8 April 2011 Low-speckle holographic beam shaping of high-coherence EUV sources

Christopher N. Anderson, Ryan H. Miyakawa, Patrick P. Naulleau

Proceedings Volume 7969, Extreme Ultraviolet (EUV) Lithography II; 796938 (2011) https://doi.org/10.1117/12.881553
Event: SPIE Advanced Lithography, 2011, San Jose, California, United States

Abstract

This paper describes a method to arbitrarily shape and homogenize high-coherence extreme ultraviolet sources using time-varying holographic optical elements and a scanning subsystem to mitigate speckle. In systems with integration times longer than 100 ms, a speckle contrast below 1% can be achieved.

Citation Download Citation

Christopher N. Anderson, Ryan H. Miyakawa, and Patrick P. Naulleau "Low-speckle holographic beam shaping of high-coherence EUV sources", Proc. SPIE 7969, Extreme Ultraviolet (EUV) Lithography II, 796938 (8 April 2011); https://doi.org/10.1117/12.881553

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