Acid proliferation to improve the sensitivity of EUV resists: a pulse radiolysis study

Kazuyuki Enomoto; Koji Arimitsu; Atsutaro Yoshizawa; Hiroki Yamamoto; Akihiro Oshima; Takahiro Kozawa; Seiichi Tagawa

doi:10.1117/12.881672

8 April 2011 Acid proliferation to improve the sensitivity of EUV resists: a pulse radiolysis study

Kazuyuki Enomoto, Koji Arimitsu, Atsutaro Yoshizawa, Hiroki Yamamoto, Akihiro Oshima, Takahiro Kozawa, Seiichi Tagawa

Proceedings Volume 7969, Extreme Ultraviolet (EUV) Lithography II; 79692M (2011) https://doi.org/10.1117/12.881672
Event: SPIE Advanced Lithography, 2011, San Jose, California, United States

Abstract

The yields of acid have been measured in the electron-beam irradiation of triphenylsulfonium triflate (TPS-Tf) and pinanediol monosulfonates, which consist of tosylate (PiTs), 4-fluorobenzenesulfonate (Pi1F), or 4-trifluoromethylbenzenesulfonate (Pi3F), as an acid amplifier blended in 4-hydroxystyrene matrixes. The acid yields efficiency decreases when PiTs is present, while its efficiency increases in the presence of Pi3F. Reactions of the electrons with TPS-Tf and pinanediol monosulfonates have been studied using pulse radiolysis in liquid tetrahydrofuran (THF) to evaluate the kinetic contributions to acid production. The THF-solvated electrons react with PiTs, Pi1F, and Pi3F to produce the corresponding radical anions; the rate constants are estimated to be 4.1, 5.1, and 9.2 × 10¹⁰ M^-1 s^-1, respectively. Electron transfer from PiTs•-, Pi1F•-, and Pi3F•- radical anions to TPS-Tf occurs with the rate constants of 5.7×10¹⁰, 1.2×10¹¹, and 6.3 × 10¹⁰ M^-1 s^-1, respectively. The long-lived Pi3F•- efficiently undergoes the electron transfer to TPS-Tf to form the TPS-Tf•-, which subsequently decompose to generate TfOH. On the other hand, the decay channels of PiTs•- and Pi1F•-, which possess a relatively short lifetime, are presumably dependent on its reactions with solvated protons (charge recombination) rather than the electron transfer to TPS-Tf. The novel acid production pathway via the electron transfer from pinanediol monosulfonate radical anions to TPS-Tf is presented.

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Kazuyuki Enomoto, Koji Arimitsu, Atsutaro Yoshizawa, Hiroki Yamamoto, Akihiro Oshima, Takahiro Kozawa, and Seiichi Tagawa "Acid proliferation to improve the sensitivity of EUV resists: a pulse radiolysis study", Proc. SPIE 7969, Extreme Ultraviolet (EUV) Lithography II, 79692M (8 April 2011); https://doi.org/10.1117/12.881672

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KEYWORDS

Electrons

Extreme ultraviolet

Absorption

Amplifiers

Liquids

Absorbance

Chemistry

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