High-brightness LPP source for actinic mask inspection

S. Ellwi; F. Abreau

doi:10.1117/12.879786

29 March 2011 High-brightness LPP source for actinic mask inspection

S. Ellwi, F. Abreau

Proceedings Volume 7969, Extreme Ultraviolet (EUV) Lithography II; 79690C (2011) https://doi.org/10.1117/12.879786
Event: SPIE Advanced Lithography, 2011, San Jose, California, United States

Abstract

EUV actinic mask inspection requires a light source with high brightness, high uptime and a small footprint. Adlyte Corporation has developed reliable, compact and cost-effective EUV sources for mask metrology and inspection applications with potential to be extended for scanner high volume manufacturing. The EUV source will generate high brightness of up to 1 kW/mm2·sr. An industry-proven high power Nd:YAG laser irradiates high-frequency tin droplets with 1.6 kW of power in short pulses. For extended operational lifetime and with high reliability, the collector integrates two methods to mitigate ionic and neutral debris, and actively manages the thermal load. Latest operational data will be presented.

Citation Download Citation

S. Ellwi and F. Abreau "High-brightness LPP source for actinic mask inspection", Proc. SPIE 7969, Extreme Ultraviolet (EUV) Lithography II, 79690C (29 March 2011); https://doi.org/10.1117/12.879786

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