Microlithography application for production of multilevel diffractive optical elements (as a security hologram feature)

Eugene Braginets; V. Kurashov; S. Honcharuk; V. Girnyk; S. Kostyukevych; K. Kostyukevych

doi:10.1117/12.879056

14 February 2011 Microlithography application for production of multilevel diffractive optical elements (as a security hologram feature)

Eugene Braginets, V. Kurashov, S. Honcharuk, V. Girnyk, S. Kostyukevych, K. Kostyukevych

Author Affiliations +

Proceedings Volume 7927, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics IV; 79271B (2011) https://doi.org/10.1117/12.879056
Event: SPIE MOEMS-MEMS, 2011, San Francisco, California, United States

Abstract

The goal of a present research is to develop a method for production of multilevel Diffractive Optical Elements (DOEs) for use in Digital Security Holograms, using the direct-writing maskless lithography system.

Citation Download Citation

Eugene Braginets, V. Kurashov, S. Honcharuk, V. Girnyk, S. Kostyukevych, and K. Kostyukevych "Microlithography application for production of multilevel diffractive optical elements (as a security hologram feature)", Proc. SPIE 7927, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics IV, 79271B (14 February 2011); https://doi.org/10.1117/12.879056

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