Sub-100nm material processing with sub-15 femtosecond picojoule near infrared laser pulses

Karsten König; Aisada Uchugonova; Martin Straub; Huijing Zhang; Maziar Afshar; Dara Feili; Helmut Seidel

doi:10.1117/12.875004

22 February 2011 Sub-100nm material processing with sub-15 femtosecond picojoule near infrared laser pulses

Karsten König, Aisada Uchugonova, Martin Straub, Huijing Zhang, Maziar Afshar, Dara Feili, Helmut Seidel

Proceedings Volume 7903, Multiphoton Microscopy in the Biomedical Sciences XI; 79031M (2011) https://doi.org/10.1117/12.875004
Event: SPIE BiOS, 2011, San Francisco, California, United States

Abstract

Ultrabroad band 12 femtosecond near infrared laser pulses at transient TW/cm² intensities and low picojoule pulse energies (mean powers < 20 mW at 85 MHz repetition rate) have been used to perform material nanoprocessing based on multiphoton ionization and plasma formation. Cut sizes of sub-wavelength, sub-100 nm which is far beyond the Abbe diffraction limit have been realized without any collateral damage effect in silicon wafers, photoresists, glass, polymers, metals, and biological targets. Multiphoton sub-15fs microscopes may become novel non-invasive 3D tools for highly precise nanoprocessing of inorganic and organic targets as well as two-photon 3D imaging.

Citation Download Citation

Karsten König, Aisada Uchugonova, Martin Straub, Huijing Zhang, Maziar Afshar, Dara Feili, and Helmut Seidel "Sub-100nm material processing with sub-15 femtosecond picojoule near infrared laser pulses", Proc. SPIE 7903, Multiphoton Microscopy in the Biomedical Sciences XI, 79031M (22 February 2011); https://doi.org/10.1117/12.875004

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