Paper
4 November 2010 Carrier dynamics of doped silicon measured by femtosecond pump-terahertz probe spectroscopy
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Abstract
The carrier dynamics and terahertz photoconductivity in the n-type silicon (n-Si) as well as in the p-type Silicon (p- Si) have been investigated by using femtosecond pump-terahertz probe technique. The measurements show that the relative change of terahertz transmission of p-Si at low pump power is slightly lower than that of n-Si, due to the lower carrier density induced by the recombination of original holes in the p-type material and the photogenerated electrons. At high pump power, the bigger change of terahertz transmission of p-Si originates from the greater mobility of the carriers compared to n-Si. The transient photoconductivities are calculated and fit well with the Drude-Smith model, showing that the mobility of the photogenerated carriers decreases with the increasing pump power. The obtained results indicate that femtosecond pump-terahertz probe technique is a promising method to investigate the carrier dynamics of semiconductors.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
QingLi Zhou, YuLei Shi, Tong Li, Bin Jin, DongMei Zhao, and CunLin Zhang "Carrier dynamics of doped silicon measured by femtosecond pump-terahertz probe spectroscopy", Proc. SPIE 7854, Infrared, Millimeter Wave, and Terahertz Technologies, 785430 (4 November 2010); https://doi.org/10.1117/12.869894
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KEYWORDS
Carrier dynamics

Terahertz radiation

Electrons

Silicon

Femtosecond phenomena

Refractive index

Semiconductors

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