Overview Of Current Scatterometer Measurements And The Impact On Optical Systems

John C. Stover

doi:10.1117/12.940446

6 November 1987 Overview Of Current Scatterometer Measurements And The Impact On Optical Systems

John C. Stover

Proceedings Volume 0776, Metrology of Optoelectronic Systems; (1987) https://doi.org/10.1117/12.940446
Event: 1987 Technical Symposium Southeast on Optics, Electro-Optics, and Sensors, 1987, Orlando, FL, United States

Abstract

Scatter in optical systems reduces signal, creates optical noise, limits resolution and has proved to be an unexpected problem in more than one optical design. On the other hand, measurement and analysis of scatter from optical components and systems is a sensitive non-contact source of information that can be used for component acceptance and control of production processes to improve surface finish. The optics required for many of the systems on the drawing board today will need to meet scatter specifications in order to function as intended. Choosing the correct scatter specification for a particular component is not always a trivial task and often when an appropriate specification is chosen there is a problem in getting the measurements taken. The temptation to rely on Total Integrated Scatter (TIS) measurements or on surface profiling via interferometry or stylus systems) is great. Unfortunately predicting scatter from profile measurements is not easy [1] and TIS is often inappropriate.

Citation Download Citation

John C. Stover "Overview Of Current Scatterometer Measurements And The Impact On Optical Systems", Proc. SPIE 0776, Metrology of Optoelectronic Systems, (6 November 1987); https://doi.org/10.1117/12.940446

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