Interferometric precision with Fourier-based deflectometry

D. Beghuin; X. Dubois; L. Joannes; X. Hutsebaut; P. Antoine

doi:10.1117/12.854879

14 May 2010 Interferometric precision with Fourier-based deflectometry

D. Beghuin, X. Dubois, L. Joannes, X. Hutsebaut, P. Antoine

Proceedings Volume 7718, Optical Micro- and Nanometrology III; 77180B (2010) https://doi.org/10.1117/12.854879
Event: SPIE Photonics Europe, 2010, Brussels, Belgium

Abstract

Optical components are routinely tested with inteferometric based techniques. It is show in this paper that Fourier based deflectometry method can be used for optical component inspection through very sensitive and precise wavefront reconstruction. The wavefront is expressed from the raw measurements of the wavefront derivatives as a Zernike polynomial expansion. The form of the polynomials permits absolute instrumental error characterization by repeated measurement of the element under test oriented at several azimuthal angles. It is shown that nanometric precision of Zernike based reconstructions can be performed and that the air turbulences are the experimental limiting factor to the instrumental precision.

Citation Download Citation

D. Beghuin, X. Dubois, L. Joannes, X. Hutsebaut, and P. Antoine "Interferometric precision with Fourier-based deflectometry", Proc. SPIE 7718, Optical Micro- and Nanometrology III, 77180B (14 May 2010); https://doi.org/10.1117/12.854879

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