Paper
8 September 2010 Fidelity comparison of phase masks for hybrid imaging
Author Affiliations +
Proceedings Volume 7652, International Optical Design Conference 2010; 76520U (2010) https://doi.org/10.1117/12.871043
Event: International Optical Design Conference 2010, 2010, Jackson Hole, WY, United States
Abstract
A significantly increased defocus tolerance can be obtained by combining pupil phase-modulation with digital demodulation in a hybrid imaging system. Designing the optimal pupil phase-modulation is however not a trivial task. We show how hybrid imaging fidelity can be predicted and used to compare arbitrary phase-modulations. The evaluations of two anti-symmetric and a symmetric phase-modulation yield initial design values that can be used for the optimization of specific hybrid designs.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tom Vettenburg, Andy Wood, Nicholas Bustin, and Andrew R Harvey "Fidelity comparison of phase masks for hybrid imaging", Proc. SPIE 7652, International Optical Design Conference 2010, 76520U (8 September 2010); https://doi.org/10.1117/12.871043
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KEYWORDS
Tolerancing

Imaging systems

Image restoration

Phase shift keying

Optical design

Optical transfer functions

Digital imaging

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