Fast-converging iterative gradient decent methods for high pattern fidelity inverse mask design

Jue-Chin Yu; Peichen Yu

doi:10.1117/12.846568

3 March 2010 Fast-converging iterative gradient decent methods for high pattern fidelity inverse mask design

Jue-Chin Yu, Peichen Yu

Proceedings Volume 7640, Optical Microlithography XXIII; 76402L (2010) https://doi.org/10.1117/12.846568
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

Convergence speed and local minimum issue have been the major issues for inverse lithography. In this paper, we propose an inverse algorithm that employs an iterative gradient-descent method to improve convergence and reduce the Edge Placement Error (EPE). The algorithm employs a constrained gradient-based optimization to attain the fast converging speed, while a cross-weighting technique is introduced to overcome the local minimum trapping.

Citation Download Citation

Jue-Chin Yu and Peichen Yu "Fast-converging iterative gradient decent methods for high pattern fidelity inverse mask design", Proc. SPIE 7640, Optical Microlithography XXIII, 76402L (3 March 2010); https://doi.org/10.1117/12.846568

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