Mask enhancer technology for sub-100nm pitch random logic layout contact hole fabrication

Takashi Yuito; Hiroshi Sakaue; Takashi Matsuda; Tadami Shimizu; Shigeo Irie; Fumio Iwamoto; Akio Misaka; Taichi Koizumi; Masaru Sasago

doi:10.1117/12.848025

12 March 2010 Mask enhancer technology for sub-100nm pitch random logic layout contact hole fabrication

Takashi Yuito, Hiroshi Sakaue, Takashi Matsuda, Tadami Shimizu, Shigeo Irie, Fumio Iwamoto, Akio Misaka, Taichi Koizumi, Masaru Sasago

Author Affiliations +

Proceedings Volume 7640, Optical Microlithography XXIII; 76401B (2010) https://doi.org/10.1117/12.848025
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

We have proposed a new resolution enhancement technology using attenuated mask with phase shifting aperture, named "Mask Enhancer", for random-logic contact hole pattern printing. In this study, we apply Mask Enhancer on sub-100nm pitch contact hole printing with 1.35NA ArF immersion lithography tool, and ensure that Mask Enhancer can improve MEEF at resolution limit and DOF at semi-dense and isolated pitch region. We demonstrate printing a fine 100nm pitch line of contacts and isolated simultaneously with MEEF of less than 4 by using Mask Enhancer and prove that Mask Enhancer is one of the most effective solutions for random logic layout contact hole fabrication for 28nm node and below.

Citation Download Citation

Takashi Yuito, Hiroshi Sakaue, Takashi Matsuda, Tadami Shimizu, Shigeo Irie, Fumio Iwamoto, Akio Misaka, Taichi Koizumi, and Masaru Sasago "Mask enhancer technology for sub-100nm pitch random logic layout contact hole fabrication", Proc. SPIE 7640, Optical Microlithography XXIII, 76401B (12 March 2010); https://doi.org/10.1117/12.848025

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