Scatterometry characterization of spacer double patterning structures

Prasad Dasari; Jiangtao Hu; Zhuan Liu; Asher Tan; Oleg Kritsun; Catherine Volkman; Chris Bencher

doi:10.1117/12.848518

1 April 2010 Scatterometry characterization of spacer double patterning structures

Prasad Dasari, Jiangtao Hu, Zhuan Liu, Asher Tan, Oleg Kritsun, Catherine Volkman, Chris Bencher

Proceedings Volume 7638, Metrology, Inspection, and Process Control for Microlithography XXIV; 76381J (2010) https://doi.org/10.1117/12.848518
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

DPT overlay errors result in CD distortions and CD non-uniformity leads to overlay errors demanding increased critical dimension uniformity (CDU) and improved overlay control. Scatterometry techniques are used to characterize the CD uniformity, focus and dose control. We will present CD distribution (CDU) and profile characterization for spacer double patterning structures by advanced scatterometry methods. Our result will include NISR, and spectroscopic ellipsometry (SE) characterization of CDU sensitivity in spacer double patterning stack. We will further show the results of spacer DP structures by NISR and SE measurements. Metrology comparison at various process steps including litho, etch and spacer and validation of CDU and profile; all benchmarked against traditional CDSEM measurements.

Citation Download Citation

Prasad Dasari, Jiangtao Hu, Zhuan Liu, Asher Tan, Oleg Kritsun, Catherine Volkman, and Chris Bencher "Scatterometry characterization of spacer double patterning structures", Proc. SPIE 7638, Metrology, Inspection, and Process Control for Microlithography XXIV, 76381J (1 April 2010); https://doi.org/10.1117/12.848518

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