Paper
11 February 2010 Highly photorefractive Eu3+ activated sol-gel SiO2-SnO2 thin film waveguides
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Abstract
We report on the photorefractive properties of tin-silica slab waveguides, deposited on vitreous-SiO2 by means of sol-gel dip-coating technique. The basic composition of these amorphous binary systems is 75 SiO2 - 25 SnO2 mol% with 1 mol% of Eu3+ ions. Europium was chosen as an optical probe of the glass structure. These guiding structures exhibit low propagation losses (around 0.5 dB/cm at 633 nm) and a high refractive index modulation, as large as - 1.5 × 10-3 under the UV irradiation of a KrF excimer laser source at λ = 248 nm, suitable for writing waveguide gratings.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
S. Berneschi, S. N. B. Bhaktha, A. Chiappini, A. Chiasera, M. Ferrari, C. Kinowski, S. Turrell, C. Trono, M. Brenci, I. Cacciari, G. Nunzi Conti, S. Pelli, and G. C. Righini "Highly photorefractive Eu3+ activated sol-gel SiO2-SnO2 thin film waveguides", Proc. SPIE 7604, Integrated Optics: Devices, Materials, and Technologies XIV, 76040Z (11 February 2010); https://doi.org/10.1117/12.843210
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Cited by 9 scholarly publications.
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KEYWORDS
Ultraviolet radiation

Waveguides

Silica

Refractive index

Sol-gels

Thin films

Glasses

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