Paper
11 February 2010 Low threshold Er3+/Yb3+ co-doped microcavity laser
Hsiu-Sheng Hsu, Can Cai, Andrea M. Armani
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Abstract
An Erbium:Ytterbium codoped microcavity-based laser which is lithographically fabricated from sol-gel is demonstrated. Both single-mode and multimode lasing is observed in the C band (1550nm). The quality factor and pump threshold are experimentally determined for a series of erbium and ytterbium doping concentrations, verifying the inter-dependent relationship between the two dopants. The lasing threshold of the optimized device is 4.2 μW.
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Hsiu-Sheng Hsu, Can Cai, and Andrea M. Armani "Low threshold Er3+/Yb3+ co-doped microcavity laser", Proc. SPIE 7604, Integrated Optics: Devices, Materials, and Technologies XIV, 76040C (11 February 2010); https://doi.org/10.1117/12.848373
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KEYWORDS
Sol-gels

Silica

Ytterbium

Erbium

Laser damage threshold

Silicon

Doping

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