Fabrication techniques of high aspect ratio vertical lightpipes using a dielectric photomask

Winnie N. Ye; Peter Duane; Munib Wober; Kenneth B. Crozier

doi:10.1117/12.840725

16 February 2010 Fabrication techniques of high aspect ratio vertical lightpipes using a dielectric photomask

Winnie N. Ye, Peter Duane, Munib Wober, Kenneth B. Crozier

Proceedings Volume 7591, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics III; 75910D (2010) https://doi.org/10.1117/12.840725
Event: SPIE MOEMS-MEMS, 2010, San Francisco, California, United States

Abstract

We report the development of new fabrication techniques for creating high aspect ratio optical lightpipes in SiO₂ layers of 10μm thickness and above. A dielectric photo mask was used for deep reactive ion etching. Our experiments show that CF₄-based reaction gases were best for deep etching with high selectivity and etch rate. Trenches with diameters or width of 1.5μm were demonstrated, with an aspect ratio of 7.2:1 and a sidewall angle of 87.4 degrees. We also present the lift-off process of the etch masks and the via-filling procedures for the lightpipes. These structures are useful for image sensors, vertical interconnect and waveguiding applications.

Citation Download Citation

Winnie N. Ye, Peter Duane, Munib Wober, and Kenneth B. Crozier "Fabrication techniques of high aspect ratio vertical lightpipes using a dielectric photomask", Proc. SPIE 7591, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics III, 75910D (16 February 2010); https://doi.org/10.1117/12.840725

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