Two-color photo-initiation/inhibition lithography

Robert R. McLeod; Benjamin A. Kowalski; Michael C. Cole

doi:10.1117/12.845850

16 February 2010 Two-color photo-initiation/inhibition lithography

Robert R. McLeod, Benjamin A. Kowalski, Michael C. Cole

Proceedings Volume 7591, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics III; 759102 (2010) https://doi.org/10.1117/12.845850
Event: SPIE MOEMS-MEMS, 2010, San Francisco, California, United States

Abstract

Traditional photolithography begins with single-photon absorption of patterned light by a photo-initiator to locally expose a resist. In two-color photo-initiation/inhibition (2PII) lithography, these exposed regions are confined by a surrounding pattern of inhibitors generated by one-photon absorption of a second color in a photo-inhibitor. Like a stencil used to confine spray-paint to a thin, sharp line, the inhibitory pattern acts as a remotely programmable, transient near-field mask to control the size and shape of the modified resist region. The inhibiting species rapidly recombine in the dark, allowing for fast sequential exposures and thus enabling fabrication of complex two- or threedimensional structures.

Citation Download Citation

Robert R. McLeod, Benjamin A. Kowalski, and Michael C. Cole "Two-color photo-initiation/inhibition lithography", Proc. SPIE 7591, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics III, 759102 (16 February 2010); https://doi.org/10.1117/12.845850

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