Paper
14 May 2010 Mask industry assessment trend analysis: 2010
Greg Hughes, Henry Yun
Author Affiliations +
Proceedings Volume 7545, 26th European Mask and Lithography Conference; 754502 (2010) https://doi.org/10.1117/12.865509
Event: 26th European Mask and Lithography Conference, 2010, Grenoble, France
Abstract
Microelectronics industry leaders consistently cite the cost and cycle time of mask technology and mask supply as top critical issues. A survey was designed with input from semiconductor company mask technologists and merchant mask suppliers and support from SEMATECH to gather information about the mask industry as an objective assessment of its overall condition. This year's assessment was the eighth in the current series of annual reports. Its data were presented in detail at BACUS, and the detailed trend analysis is presented at EMLC. With continued industry support, the report can be used as a baseline to gain perspective on the technical and business status of the mask and microelectronics industries. The report will continue to serve as a valuable reference to identify the strengths and opportunities of the mask industry. Its results will be used to guide future investments on critical path issues. This year's survey is basically the same as the surveys in 2005 through 2009. Questions are grouped into six categories: General Business Profile Information, Data Processing, Yields and Yield Loss Mechanisms, Delivery Times, Returns, and Services. Within each category is a multitude of questions that creates a detailed profile of both the business and technical status of the critical mask industry.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Greg Hughes and Henry Yun "Mask industry assessment trend analysis: 2010", Proc. SPIE 7545, 26th European Mask and Lithography Conference, 754502 (14 May 2010); https://doi.org/10.1117/12.865509
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KEYWORDS
Photomasks

Data processing

Microelectronics

Current controlled current source

Lithography

Semiconductors

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