Inductively coupled plasma etching of SOI and its applications in submicron optical waveguide devices

Zhongchao Fan; Weihua Han; Fuhua Yang; Xuejun Xu; Qingzhong Huang; Xi Xiao; Yu Zhu; Yuntao Li; Zhiyong Li; Yude Yu; Jinzhong Yu

doi:10.1117/12.843461

26 October 2009 Inductively coupled plasma etching of SOI and its applications in submicron optical waveguide devices

Zhongchao Fan, Weihua Han, Fuhua Yang, Xuejun Xu, Qingzhong Huang, Xi Xiao, Yu Zhu, Yuntao Li, Zhiyong Li, Yude Yu, Jinzhong Yu

Author Affiliations +

Proceedings Volume 7516, Photonics and Optoelectronics Meetings (POEM) 2009: Optoelectronic Devices and Integration; 75160B (2009) https://doi.org/10.1117/12.843461
Event: Photonics and Optoelectronics Meetings 2009, 2009, Wuhan, China

Abstract

SOI promises a good platform for dense integration of optical devices. However, as dimensions scale down, propagation losses mainly caused by the scattering loss at sidewall had been serious problems. ICP etching of SOI is proved to be an available anisotropic etch technique to make submicron optical waveguide devices. With the help of e-beam lithography, We fabricated Single-mode submicron rib SOI waveguide with propagation loss as low as 1.2 dB/mm. Examples of SOI optical waveguide devices are also presented, such as sharp bends and ring resonators with a quality factor larger than 50,000.

Citation Download Citation

Zhongchao Fan, Weihua Han, Fuhua Yang, Xuejun Xu, Qingzhong Huang, Xi Xiao, Yu Zhu, Yuntao Li, Zhiyong Li, Yude Yu, and Jinzhong Yu "Inductively coupled plasma etching of SOI and its applications in submicron optical waveguide devices", Proc. SPIE 7516, Photonics and Optoelectronics Meetings (POEM) 2009: Optoelectronic Devices and Integration, 75160B (26 October 2009); https://doi.org/10.1117/12.843461

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