Paper
23 September 2009 FPGA as the programmable tool for yield improvement
Tho L. La, Xiao-Yu Li, Charles Chen, M. H. Wang, Chih-Chung Huang, Ching-Tsai Chang, Hornjaan Lin, Yming Tseng, Ian Tseng, You R. Wu, Shih Chieh Lo, Sam C. Y. Lin
Author Affiliations +
Abstract
FPGA programmability is utilized to profile the intra-field process variation through mapping of Tilo propagation delay within a reticle field. ASML DoseMapper patented technology is used to optimize poly photo exposure based on the FPGA intra-field process variation profile. As a result, significant yield and performance improvement is achieved.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tho L. La, Xiao-Yu Li, Charles Chen, M. H. Wang, Chih-Chung Huang, Ching-Tsai Chang, Hornjaan Lin, Yming Tseng, Ian Tseng, You R. Wu, Shih Chieh Lo, and Sam C. Y. Lin "FPGA as the programmable tool for yield improvement", Proc. SPIE 7488, Photomask Technology 2009, 74883N (23 September 2009); https://doi.org/10.1117/12.829744
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KEYWORDS
Field programmable gate arrays

Critical dimension metrology

Semiconducting wafers

Yield improvement

Patents

Reticles

Lanthanum

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