Jet and flash imprint lithography for the fabrication of patterned media drives

Gerard M. Schmid; Cynthia Brooks; Zhengmao Ye; Steve Johnson; Dwayne LaBrake; S. V. Sreenivasan; Douglas J. Resnick

doi:10.1117/12.833366

23 September 2009 Jet and flash imprint lithography for the fabrication of patterned media drives

Gerard M. Schmid, Cynthia Brooks, Zhengmao Ye, Steve Johnson, Dwayne LaBrake, S. V. Sreenivasan, Douglas J. Resnick

Proceedings Volume 7488, Photomask Technology 2009; 748820 (2009) https://doi.org/10.1117/12.833366
Event: SPIE Photomask Technology, 2009, Monterey, California, United States

Abstract

The ever-growing demand for hard drives with greater storage density has motivated a technology shift from continuous magnetic media to patterned media hard disks, which are expected to be implemented in future generations of hard disk drives to provide data storage at densities exceeding 10¹² bits per square inch. Jet and Flash Imprint Lithography (J-FIL^TM) technology has been employed to pattern the hard disk substrates. This paper discusses the infrastructure required to enable J-FIL in high-volume manufacturing; namely, fabrication of master templates, template replication, high-volume imprinting with precisely controlled residual layers, dual-sided imprinting and defect inspection. Imprinting of disks is demonstrated with substrate throughput currently as high as 180 disks/hour (dual-sided). These processes are applied to patterning hard disk substrates with both discrete tracks and bit-patterned designs.

Citation Download Citation

Gerard M. Schmid, Cynthia Brooks, Zhengmao Ye, Steve Johnson, Dwayne LaBrake, S. V. Sreenivasan, and Douglas J. Resnick "Jet and flash imprint lithography for the fabrication of patterned media drives", Proc. SPIE 7488, Photomask Technology 2009, 748820 (23 September 2009); https://doi.org/10.1117/12.833366

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